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Fabrication of an Implantable Micro-pressure Sensor to Measure Deviation Within the Cochlea

dc.creatorPerez, Leonardo
dc.creatorPuers, Robert
dc.creatorVolckaerts, Bart
dc.date2013-06-02
dc.date.accessioned2019-11-08T21:23:23Z
dc.date.available2019-11-08T21:23:23Z
dc.identifierhttp://hemeroteca.unad.edu.co/index.php/publicaciones-e-investigacion/article/view/1102
dc.identifier10.22490/25394088.1102
dc.identifier.urihttps://repository.unad.edu.co/handle/10596/29649
dc.descriptionThe Cochlear Implant is broadly worn by people with deep hearing damage. This device makes up an electrode array to electrically stimulate the auditory nerves. When the electrode is implanted into the inner ear by surgery, the scala tympani is ill-treated due to the strong pressure applied on the internal ear structures. To minimize this intra-cochlear trauma, it is proposed to fabricate a micro pressure-sensor and built it in the electrode array, in such a way that the pressure applied by the electrode is measured. This work selected the MEMS SU-8 Fabry-Perot interferometer-based pressure sensor. This paper describes the sensor fabrication process carried out, and explains how to integrate this sensor with the electrode array.en-US
dc.descriptionEl implante coclear es ampliamente utilizado por personas con año auditivo profundo. Este dispositivo se compone de un conjunto de electrodos que estimulan eléctricamente los nervios auditivos. Cuando el electrodo es insertado quirúrgicamente en el oído interno, la escala timpani es maltratada debido a las considerables presiones aplicadas a las estructuras internas del oído. Esto ocasiona trauma, lo cual es indeseado. y es principalmente causado por el contacto del electrodo con las paredes de la cóclea. Para minimizar este trauma, se propone fabricar un MEMS sensor de presión para que sea integrado al conjunto de electrodos; permitiendo medir la presión aplicada al oído. Este trabajo ha seleccionado el SU8 MEMS sensor de presión basado en el efecto de interferencia óptica. Este artículo describe el proceso de fabricación del sensor y como se puede integrar al array de electrodos.es-ES
dc.formatapplication/pdf
dc.languageeng
dc.publisherUniversidad Nacional Abierta y a Distancia, UNADes-ES
dc.relationhttp://hemeroteca.unad.edu.co/index.php/publicaciones-e-investigacion/article/view/1102/1265
dc.relation/*ref*/O. Adunka and J. Kiefer. Impact of electrode insertion depth on intracochlear trauma. Journal: Elsevier Inc. Otoralyngology-Head and Neck Surgery. United States: pags 374-382, 2006. [2] P. Roland and W. Gstonttner and O. Adunka. Method for hearing preservation in cochlear implant surgery, Journal: Elsevier Inc. United States: pags 93 - 100, 2005. [3] F. Ceyssens and M. Driesen and R. Puers. An optical absolute pressure sensor for high-temperature applications, fabricated directly on a fiber, Journal: Micromechanics and Microengi- neering. Belgium, 2005. [4] G. Hill and R. Melamud and F. Declerq and A. Davenpoirt and I. Chan and H and B. Pruit SU-8 MEMS Fabry- Perot pressure sensor, Journal: micromechanics and micro- engineering. Vol 13. Pags 52-62 United States, 2007. [5] B. Chen and G. Clark and R. Jones. Evaluation of trayectories and contacts pressures for the straight nucleous cochlear implant electrode array - a two dimensional application of finite element analysis, Elsevier Inc. United states, 2002. [6] J. Roland. A model for cochlear implant insertion and force evaluation: Results with new electrode design and insertion technique, New york University: Laryngoscope. Pag 115. United States, 2005. [7] T. Ran Hsu. MEMS and Microsystems: Design and Manufac- ture, McGraw-Hill: Science/Engineering/Math.1st Ed. 2001. [8] MEMSCYCLOPEDIA, SU8 resist. Thick photo-resistor for MEMS. http://memscyclopedia.org/. [9] J. Hammacker and A. Fuelle and J. Flaemig and J. Saupe and B. Loechele and J. Grim Stress engineering and me- chanical propierties of SU-8 layers for mechanical applications, Microsyst Tech United states, 14:1515-1523. 2008. [10] P. Abgrall and V. Conedera and H. Camon and A. Gue and N. Nguyen SU-8 as a structural material for labson- chips and microelectromechanical systems. Electrophoresis 28. 2007. [11] F. Lindemans and N.F. de Rooij Microsystems technologies for implantable applications. J. Micromech and Microeng 17. R50-R80.2007. [12] J. Lotters and W. Olthuis and P.H. Veltink and P. Bergveld The mechanical propierties of the rubber elasctic polymer poly- dimethylsiloxane for sensor applications. Journal: Microchem and Microeng. Pags 145-147. 1997. [13] A. del Campo and C. Greiner Su-8: a prhotoresistor for high aspect ratio and 3D submicron lithography. Journal: Mi- crochem and Microeng. 2007. [14] N. J. Shirtcliffe and S. Aquil and C. Evans and G. McHale and M.I. Newton and C. Perry and P. Roach The use of high aspect ratio photoresistor (SU-8) for super-hydrophobic pattern prototyping. Journal: Microchem and Microeng. Vol14. Pags 1384-1389. 2004.
dc.rightsCopyright (c) 2015 Publicaciones e Investigaciónes-ES
dc.rightshttp://creativecommons.org/licenses/by-sa/4.0es-ES
dc.sourceMagazine specialized in Engineering; Vol. 7 (2013); 11-18en-US
dc.sourcePublicaciones e Investigación; Vol. 7 (2013); 11-18es-ES
dc.source2539-4088
dc.source1900-6608
dc.subjectCochlear implant; MEMS sensor; SU8 material; Intra-cochlear traumaen-US
dc.subjectimplante coclear; material SU8 ; sensores MEMS; trauma Intra - cocleares-ES
dc.titleFabrication of an Implantable Micro-pressure Sensor to Measure Deviation Within the Cochleaen-US
dc.titleFabricación de un Micro Sensor de Presión Implantable Aplicado a Medir Desviaciones Dentro de la Cochleaes-ES
dc.typeinfo:eu-repo/semantics/article
dc.typeinfo:eu-repo/semantics/publishedVersion


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